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ALD for Powders and Flat Substrates

  • HIGH THROUGHPUT WAFER COATING SYSTEM

    The Apollo system product line sets new benchmarks in atomic layer deposition productivity and cost effectiveness. Designed for high volume semiconductor wafer-based production, our Semi-S2 certified Apollo systems integrate the high productivity of SMFD-ALD with a revolutionary simple substrate handling. The result is a flexible, modular system that can be easily configured to our customers’ needs.
  • LAB-SCALE ATOMIC LAYER DEPOSTION

    We created Prometheus to enable atomic layer deposition research. Research and development for ALD has never been easier. Our tools put ALD at your fingertips. Forge Nano has installed Prometheus in laboratories and universities all over the world.
  • LAB-SCALE ATOMIC LAYER DEPOSTION

    We created Prometheus to enable atomic layer deposition research. Research and development for ALD has never been easier. Our tools put ALD at your fingertips. Forge Nano has installed Prometheus in laboratories and universities all over the world.
  • R&D SCALE WAFER COATING SYSTEM

    THEIA combines the production-proven design and system components of our commercial solution, APOLLO, in an R&D package that delivers unmatched performance, flexibility, reliability, and safety. THEIA is field upgradeable to accommodate the ever-changing needs of scientists and engineers, enabling a seamless transition from R&D to production. Recipes created with THEIA can be sent to APOLLO for a simple and straightforward path to commercial scale production of semiconductor wafer coating.